Ultrashortpuls Laser System I: Spectra Physics Spitfire

• Spectra Physics Spitfire (Ti-Sa-Amplifier):
  Wavelength 800 nm, average power 5 W, pulse energy 1 mJ, pulse duration 110 fs, repetition rate 5 kHz
• Seedlaser: Spectra Physics Mai Tai (frequency doubled Nd:YVO4-Laser):
  Wavelength 800 nm, average power 500 mW, pulse duration 110 fs, repetition rate 80 MHz
• Pumplaser Spectra Physics Empower 30 (frequenzydoubled Nd:YLF-Laser)
  Wavelength 532 nm, average power 25 W, pulse duration 100 ns, repetition rate 5 kHz

Ultrashortpuls Laser System II: Spectra Physics Tsunami

• Spectra Physics Tsunami (Ti-Sa-Amplifier):
  Wavelength 700 - 850 nm, average power 1 W @740 nm, pulse energy, pulse duration < 80 fs
• Pumplaser Spectra Physics Millenia
  Wavelength 532 nm, power 10 W

Ultrashortpuls Laser I: Light Conversion Carbide CB3-40W

• Wavelength 1030 nm, 515 nm or 343 nm, average power 41,5 W @1030 nm, 22,6 W @515 nm, 11,3 W @343 nm, max. pulse energy 410 µJ @1030 nm, 113 µJ @515 nm, 225 µJ @343 nm, pulse duration 193 fs - 10 ps, single puls bis 2 MHz (normal mode), 2,5 GHz Intra-Burst, 63 MHz Inter-Burst (burst mode)

Ultrashortpuls Laser II: Jenoptik JenLas D2fs

• Wavelength 1025 nm, pulse energy 40 µJ @100 kHz repetition rate, 20 µJ @200kHz repetition rate, pulse duration < 400 fs

Ti:Sapphire Laser: M Squared SolsTiS

• Wavelength tunable from 640 to 1100 nm, power 2,4 W, linewidth <100 kHz

DPSS Laser: Ekspla NT 230

• Wavelength tunable from 200 to 2600 nm, pulse energy < 15 mJ, pulse duration 2 - 5 nm, repetition rate 10 Hz

Faserlaser: SPI Lasers redPower Cube

• Wavelength 1075 +/-7 nm, power 1,5 kW

Fibercoupled Nd:YAG Laser: Lasag SLS 200 CL16

• Wavelength 1064 nm, average power 50 W, pulse energy 40 J, pulse duration 0,1 - 100 ms, repetition rate 0,1 - 500 Hz

Fiberlaser Modul: SWS Laser FLR-50-SC-OEM

• Wavelength 1064 nm, average power 50 W, various pulse lengths adjustable, repetition rates 20 - 1000 kHz
• With galvo scanner as marking system
• Built into a housing, with extraction system

Additive manufacturing I: DMG Mori SLM 125

• Powder bed system with an installation space of 125x125x200mm³
• Fiber laser (IPG) central emission wavelength 1070 nm ± 5 nm with 400W
• Focus size control with smallest diameter of 35µm
• Angular rotating double cassette coater for powder application
• Automatic powder feed with a tank capacity of 10L
• Integrated suction cup with powder cleaning

Additive manufacturing II: Trumpf Lasma-443

• Three-axis CNC processing station for additive manufacturing (DED-LB) and laser material processing
• Fiber laser (redPOWER® QUBE, SPI Lasers, United Kingdom) central emission wavelength 1075 nm ± 7 nm
• Integrated temperature control: Metis H318 (120 °C - 520 °C); Metis H322 (700 °C - 2300 °C) (Sensortherm GmbH, Germany)
• Powder feeder unit: PF 2/1 LC (GTV Verschleißschutz GmbH, Germany) 5l container volume

Additive manufacturing III: Orlaser ORLAS Cube

• Three-axis CNC processing station for additive manufacturing (DED-LB) and laser material processing
• Fiber laser (IPG) central emission wavelength 1070 nm ± 5 nm with 450W (CW)/4500W (pulsed)
• Integrated temperature control: Metis H322 ratio pyrometer (700 °C - 2300 °C) (Sensortherm GmbH, Germany) and PI 05 infrared camera (900 - 2000 °C) (Optris GmbH)
• Powder feeder unit: PF 2/1 LC (GTV Verschleißschutz GmbH, Germany) 5 l container volume with integrated dynamic control of the material flow

Additive manufacturing IV: Lunovu robotergestützes Draht Auftragschweißen

• Two ABB 6-axis robots on a linear axis and a turn-tilt positioner:
• Robot I with milling spindle
• Robot II with Precitec Coaxprinter for wire thicknesses from 1 to 1.6 mm
• Laser: IPG 6000 YLS: 6 kW fiber laser
• Wire feeder Dinse DIX FDE 150
• Actively protected laser safety cell with extraction system

The system is set up in the ZESS research building. Further information.

Scanning electron microscope: Zeiss EVO MA10

• Filament LaB6 Cathode
• 3 nm resolution at 30 kV
• Variable pressure range 10 - 400 Pa
• Secondary electron detector
• Backscattered electron detector
• EDX detector
• Up to 30 kV acceleration voltage

White-light interferometer microscope: Polytec TMS-1200

• Vertical measuring range 250 µm
• Vertical resolution 0.035 nm
• Maximum measuring field size approx. 4 mm (depending on the lens used)

Raman microscope: Renishaw inVia

• Three excitation wavelengths: 532 nm, 633 nm, 785 nm
• Spectral range: 200 nm - 2200 nm
• Sepctral resolution: 0.3 cm^-1
• Lateral resolution: 0.25 µm

Laser Scanning Microscope: Olympus LEXT OLS 5000

• Confocal laser scanning microscope
• Magnification 54x to 17,280x
• Resolution z direction: 0.5 nm
• Resolution x, y direction: 1 nm

Measuring microscope: Nikon Eclipse LV 1000

• Microscope with episcopic and diascopic illumination
• Nikon Sight DS-Fi2 digital camera
• NIS Element software

Solar simulator: Wavelabs Sinus-70

• Light source with 21 LEDs
• Spectral range from 350 nm to 1280 nm
• Intensity from 0.1 to 1.1 suns
• Various spectra can be set

UV-VIS-NIR Spectrometer: Shimadzu UV-3600Plus

• Wavelength range: 185 m- 3,300 nm
• Resolution: 0.1 nm
• Intergrating Sphere
• Detector: Photomultiplier tube / InGaAs photodiode / PbS photoconductive element

Ellipsometer: Accurion nanofilm_ep4

• Imaging ellipsometer for determining the thickness and refractive index of thin films
• Measuring range: 0.1 nm to 10 µm
• Lateral resolution: 1 µm

Glovebox: GS Glovebox Systemtechnik GPT2

• Inert atmosphere through argon flushing
• Two airlocks
• Built-in spin coater

Particle analyzer: Microtrac NANO-flex

• Size determination of particles using dynamic light scattering
• Measuring range 0.8 nm to 6.5 µm particle size
• Measurement without prior knowledge of the size distribution